Axcelis Technologies

Makes ion implantation systems for semiconductor manufacturers. Its Purion H200 combines high-current implantation with medium-energy processing for silicon and silicon-carbide applications.

HQ US

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Facts

Source per value
Process step The main fab or back-end step the company sells equipment for, our grouping of the process steps in its cited product material. "Several steps" means three or more.
Ion implantation 1
HQ country Country of the corporate headquarters or principal corporate address stated by the company.
United States 3
Process steps covered Manufacturing or test stages covered by the cited equipment; illustrative rather than an exhaustive company portfolio.
Ion implantation 1
Tools and product families Named equipment models or product families supported by the cited vendor material.
Purion H200 1
Target devices and applications Device types, materials or production uses the source states for the tool.
Power devices, analog, BCD and mature-node devices 2
AI-relevant tools True where the vendor or its filings tie a named tool to AI, HBM or AI data-center chips. Empty means the link is not in our sources, not that none exists.
Not published
AI-relevant tools (detail) The tool and the AI, HBM or data-center link, as the source states it.
Not published
AI inside the equipment AI or machine-learning functions the vendor describes in its inspection, metrology or equipment analytics. Not the same as chips made for AI.
Not published
Wafer or ingot diameters mm Model-specific diameters in mm. Crystal-growth entries refer to ingot diameter. Twelve-inch wafers are nominal 300 mm.
Purion H200: silicon 200/300; SiC 150/200 2
Operating wavelength nm Light wavelength of the named lithography or inspection tool.
Not published
Patterning resolution Model-specific resolution or minimum linewidth with the vendor’s qualifiers. Not interchangeable with a process-node label.
Not published
Alignment, overlay or probing accuracy The vendor’s own overlay, placement, alignment or probing metric with units and statistical definition. Metrics are not directly comparable across vendors.
Not published
Rated throughput Vendor-stated model throughput with units and test conditions; dry-cycle and maximum rates are labelled.
Not published
Technical capabilities Model-specific process ranges, configurations or capabilities. Comparative performance claims are attributed to the vendor.
Purion H200 implant energy range: 10–230 keV 1
Batch or chamber capacity Wafers per batch or process chambers, for the cited model.
Not published
Process or test temperature °C Temperature range or limit for the named equipment, with configuration qualifiers.
Not published
Substrate or die dimensions Model-specific substrate, panel or die dimensions and units.
Not published
Wafer inspection coverage % Inspection coverage the vendor states for the named capability. It is not a defect-detection rate.
Not published
Automation and integration Material handling, maintenance or factory interfaces supported by the cited model.
Not published
Annual revenue Total company revenue for the fiscal year named, from the annual filing or annual report, in the reporting currency. Includes any non-equipment segments the company has.
US$839.0 million, 2025 5
Market share or position Segment-specific share or ranking claim, with year and geography. Vendor claims are labelled as claims; segments are not comparable.
Not published
Market-share basis Research provider, measurement basis and period behind the paired market-share figure.
Not published
Installed base or shipments Dated cumulative shipments disclosed by the vendor. Shipments are not necessarily active installed systems.
Not published
Customers Customer types or named customers in the source.
Not published
Commercial or corporate status Dated product adoption, qualification or pending corporate transaction.
Merger with Veeco pending; China SAMR clearance is the only regulatory approval outstanding; close expected by end of Q1 2027 (10-Q filed 2026-11-05) 4
Product launch Dated product announcement or sales launch, with context.
Not published
Headquarters Corporate headquarters or principal corporate address as the company states it.
Beverly, Massachusetts, United States 3

Sources

  1. axcelis.com / medium energy accessed 2026-11-11
  2. axcelis.com / Introducing the PurionH200 Single Wafer High Current Im accessed 2026-11-11
  3. investor.axcelis.com / axcelis technologies and veeco instruments provide upda accessed 2026-11-11
  4. Axcelis Form 10-Q, quarter to 30 Sep 2026 (SEC) accessed 2026-11-11
  5. Axcelis Technologies Form 10-K (SEC) accessed 2026-11-11

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