Oxford Instruments Plasma Technology

Makes plasma process equipment for semiconductor manufacturing. Its PlasmaPro 100 Cobra ICP etcher serves compound-semiconductor, power-device, optoelectronic, MEMS, and sensor applications.

HQ GB Etch

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Facts

Source per value
Process step The main fab or back-end step the company sells equipment for, our grouping of the process steps in its cited product material. "Several steps" means three or more.
Etch and strip 1
HQ country Country of the corporate headquarters or principal corporate address stated by the company.
United Kingdom 2
Process steps covered Manufacturing or test stages covered by the cited equipment; illustrative rather than an exhaustive company portfolio.
Inductively coupled plasma reactive-ion etch 1
Tools and product families Named equipment models or product families supported by the cited vendor material.
PlasmaPro 100 Cobra 1
Target devices and applications Device types, materials or production uses the source states for the tool.
GaAs/InP optoelectronics; SiC/GaN power and RF; MEMS and sensors 1
AI-relevant tools True where the vendor or its filings tie a named tool to AI, HBM or AI data-center chips. Empty means the link is not in our sources, not that none exists.
Not published
AI-relevant tools (detail) The tool and the AI, HBM or data-center link, as the source states it.
Not published
AI inside the equipment AI or machine-learning functions the vendor describes in its inspection, metrology or equipment analytics. Not the same as chips made for AI.
Not published
Wafer or ingot diameters mm Model-specific diameters in mm. Crystal-growth entries refer to ingot diameter. Twelve-inch wafers are nominal 300 mm.
PlasmaPro 100 Cobra: up to 200 1
Operating wavelength nm Light wavelength of the named lithography or inspection tool.
Not published
Patterning resolution Model-specific resolution or minimum linewidth with the vendor’s qualifiers. Not interchangeable with a process-node label.
Not published
Alignment, overlay or probing accuracy The vendor’s own overlay, placement, alignment or probing metric with units and statistical definition. Metrics are not directly comparable across vendors.
Not published
Rated throughput Vendor-stated model throughput with units and test conditions; dry-cycle and maximum rates are labelled.
Not published
Technical capabilities Model-specific process ranges, configurations or capabilities. Comparative performance claims are attributed to the vendor.
Not published
Batch or chamber capacity Wafers per batch or process chambers, for the cited model.
Not published
Process or test temperature °C Temperature range or limit for the named equipment, with configuration qualifiers.
Electrode range: -150°C to +400°C; cooling/heating configuration dependent 1
Substrate or die dimensions Model-specific substrate, panel or die dimensions and units.
Not published
Wafer inspection coverage % Inspection coverage the vendor states for the named capability. It is not a defect-detection rate.
Not published
Automation and integration Material handling, maintenance or factory interfaces supported by the cited model.
Not published
Annual revenue Total company revenue for the fiscal year named, from the annual filing or annual report, in the reporting currency. Includes any non-equipment segments the company has.
Not published
Market share or position Segment-specific share or ranking claim, with year and geography. Vendor claims are labelled as claims; segments are not comparable.
Not published
Market-share basis Research provider, measurement basis and period behind the paired market-share figure.
Not published
Installed base or shipments Dated cumulative shipments disclosed by the vendor. Shipments are not necessarily active installed systems.
Not published
Customers Customer types or named customers in the source.
Not published
Commercial or corporate status Dated product adoption, qualification or pending corporate transaction.
Not published
Product launch Dated product announcement or sales launch, with context.
Not published
Headquarters Corporate headquarters or principal corporate address as the company states it.
United Kingdom 2

Sources

  1. plasma.oxinst.com / plasmapro 100 cobra icp accessed 2026-11-11
  2. plasma.oxinst.com / trainings transformative potential accessed 2026-11-11

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